Mo allory target mo alloy target in ChinaShenzhen Sunrise Metal Industry Co.,Ltd
mo alloy target
Density:10.2g/cm3
Purity:99.95%
Quality Certificate:ISO9001
0086-0755-27185042
http://www.sunriseta.com
sales@sunriseta.com
http://www.sunriseta.com
sales@sunriseta.com
skype :Li.mary9
QQ :1957953030
wahtsapp: 15919982500
- Application: industrial,electrical,vacuum etc
- Shape: round
- Material: Molybdenum
- Dimensions: as request
- Chemical Composition: 99.95% Mo
- surface: polished
Packaging & Delivery
| Packaging Details: | Plywood case or as customers request |
|---|---|
| Delivery Detail: | 7-20 days |
Specifications
Density:10.2g/cm3
Purity:99.95%
Quality Certificate:ISO9001
mo alloy target
1. Appplication:
Molybdenum discs are widely used as contact materials in silicon controlled
rectifier diodes, transistors and thyristors mounting material for power
semiconductor devices and heat sink bases.
2.Characteristics:
1) high melting point, high strength,
2) smooth and clean surface,
3) good conductions, small linear expansion coefficient and goodheat-resistance
2) smooth and clean surface,
3) good conductions, small linear expansion coefficient and goodheat-resistance
HIP Mo alloy target is mainly used in electronic touch screen coating. Product maximum size of φ500 * 2000mm, grain size ≤100μm, density ≥99%, purity ≥99.5%.
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| Shape: | Disk Targets, Rectangle Targets, Column Targets, Step Targets, Custom-made | ||
| Size: | Circular: Diameter<14inch, Thick >1mm; Block: Length<32inch, Width<12inch, Thick >1mm | ||
| Synonyms: |
Tantalum Molybdenum (Ta-Mo) Alloy Sputtering Targets, Ta-Mo Alloy Sputtering Target, Ta-Mo Alloy Sputter Target, Ta-Mo Alloy Target, Tantalum Molybdenum Alloy Sputtering Target, Tantalum Molybdenum Alloy Sputter Target, Tantalum Molybdenum Alloy Targ
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