2016年4月22日星期五

铬 ChromiumShenzhen Sunrise Metal Industry Co.,Ltd


Chromium

Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact  Shenzhen Sunrise Metal Industry Co.,Ltd
skype :Li.mary9
QQ :1957953030
wahtsapp: 15919982500
for current pricing or for a quote on sputtering targets and other deposition products not listed.

Specifications

Material TypeChromium
SymbolCr
Atomic Weight51.9961
Atomic Number24
Color/AppearanceSilvery, Metallic
Thermal Conductivity94 W/m.K
Melting Point (°C)1,857
Coefficient of Thermal Expansion4.9 x 10-6/K
Theoretical Density (g/cc)7.2
Z Ratio0.305
SputterDC
Max Power Density
(Watts/Square Inch)
100
Type of BondIndium
sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis

































Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

包装

1 ea in rigid mailer

性质Shenzhen Sunrise Metal Industry Co.,Ltd

skype :Li.mary9
QQ :1957953030
wahtsapp: 15919982500

Related CategoriesAlternative Energy, Chromium, Metal and Ceramic Science, Metals, Micro/NanoElectronics,
更多...
assay  99.95% trace metals basis
resistivity  12.7 μΩ-cm, 20°C
diam. × thickness  3.00 in. × 0.125 in.
bp  2672 °C(lit.)
mp  1857 °C(lit.)
density  7.14 g/mL at 25 °C(lit.)

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