铬
Chromium
Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact Shenzhen Sunrise Metal Industry Co.,Ltd
0086-0755-27185042
http://www.sunriseta.com
sales@sunriseta.com
skype :Li.mary9
QQ :1957953030
wahtsapp: 15919982500
for current pricing or for a quote on sputtering targets and other deposition products not listed.
0086-0755-27185042
http://www.sunriseta.com
sales@sunriseta.com
http://www.sunriseta.com
sales@sunriseta.com
Specifications
Material Type Chromium
Symbol Cr
Atomic Weight 51.9961
Atomic Number 24
Color/Appearance Silvery, Metallic
Thermal Conductivity 94 W/m.K
Melting Point (°C) 1,857
Coefficient of Thermal Expansion 4.9 x 10-6/K
Theoretical Density (g/cc) 7.2
Z Ratio 0.305
Sputter DC
Max Power Density
(Watts/Square Inch) 100
Type of Bond Indium
sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis
| Material Type | Chromium |
| Symbol | Cr |
| Atomic Weight | 51.9961 |
| Atomic Number | 24 |
| Color/Appearance | Silvery, Metallic |
| Thermal Conductivity | 94 W/m.K |
| Melting Point (°C) | 1,857 |
| Coefficient of Thermal Expansion | 4.9 x 10-6/K |
| Theoretical Density (g/cc) | 7.2 |
| Z Ratio | 0.305 |
| Sputter | DC |
| Max Power Density (Watts/Square Inch) | 100 |
| Type of Bond | Indium |
Application
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
包装
1 ea in rigid mailer
性质Shenzhen Sunrise Metal Industry Co.,Ltd
0086-0755-27185042
http://www.sunriseta.com
sales@sunriseta.com
http://www.sunriseta.com
sales@sunriseta.com
skype :Li.mary9
QQ :1957953030
wahtsapp: 15919982500
| Related Categories | Alternative Energy, Chromium, Metal and Ceramic Science, Metals, Micro/NanoElectronics, |
| assay | 99.95% trace metals basis |
| resistivity | 12.7 μΩ-cm, 20°C |
| diam. × thickness | 3.00 in. × 0.125 in. |
| bp | 2672 °C(lit.) |
| mp | 1857 °C(lit.) |
| density | 7.14 g/mL at 25 °C(lit.) |






























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